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Credit Hours: 3 Effective Term: Fall 2017 SUN#: None AGEC: None |
Credit Breakdown: 2 Lectures, 3 Labs Times for Credit: 1 Grading Option: A, B, C, D, F Cross-Listed: |
Measurable Student Learning Outcomes |
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1. (Evaluation Level) Select the appropriate patterning method for unique applications.
2. (Knowledge Level) Identify the chemical makeup of common resists. 3. (Analysis Level) Identify and analyze the mechanical and resolution limits of various lithography tools. 4. (Comprehension Level) Identify and explain the phase separation of block copolymers. 5. (Comprehension Level) Describe the role of e-beam lithography to design masks, and as a direct write tool. 6. (Analysis Level) Analyze and explain the economic viability of various lithography techniques. 7. (Evaluation Level) Identify and evaluate the basic design and operation of an Atomic Force Microscopy (AFM) as a lithography tool. |
Internal/External Standards Accreditation |
Nanotechnology Standards: ASTM URL: http://www.astm.org/Standards/nanotechnology-standards.html |