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MET 293 Patterning for Nanotechnology
Credit Hours:  3
Effective Term: Fall 2017
SUN#: None
AGEC: None  
Credit Breakdown: 2 Lectures, 3 Labs
Times for Credit: 1
Grading Option: A, B, C, D, F

Description: Hands-on treatment of all aspects of advanced pattern transfer and pattern transfer equipment, including probe techniques, stamping and embossing, electron beam, and optical contact and stepper systems. Prerequisite: MET292.

Prerequisites: MET292

Corequisites: None

Recommendations: None

Measurable Student Learning Outcomes
1. (Evaluation Level) Select the appropriate patterning method for unique applications.
2. (Knowledge Level) Identify the chemical makeup of common resists.
3. (Analysis Level) Identify and analyze the mechanical and resolution limits of various lithography tools.
4. (Comprehension Level) Identify and explain the phase separation of block copolymers.
5. (Comprehension Level) Describe the role of e-beam lithography to design masks, and as a direct write tool.
6. (Analysis Level) Analyze and explain the economic viability of various lithography techniques.
7. (Evaluation Level) Identify and evaluate the basic design and operation of an Atomic Force Microscopy (AFM) as a lithography tool.
Internal/External Standards Accreditation
Nanotechnology Standards: ASTM URL: http://www.astm.org/Standards/nanotechnology-standards.html