![]() | Back |
Credit Hours: 3 Effective Term: Fall 2017 SUN#: None AGEC: None |
Credit Breakdown: 2 Lectures, 3 Labs Times for Credit: 1 Grading Option: A, B, C, D, F Cross-Listed: |
Measurable Student Learning Outcomes |
---|
1. (Knowledge Level) Identify and define the differences and applications of "top down" and "bottom up" manufacturing.
2. (Evaluation Level) Define the importance of controlled environments for nanotechnology manufacturing and evaluate a site. 3. (Synthesis Level) Identify potential contamination issues in nanotechnology, explain techniques for preventing contamination and create a plan to maintain a contaminant-free environment. 4. (Application Level) Define, explain and demonstrate contamination removal methods. 5. (Knowledge Level) Define applications of colloidal chemistry to nanotechnology. 6. (Analysis Level) Analyze and explain the importance of surface adhesion and delamination. 7. (Analysis Level) Analyze etch features and quantify etch rates. 8. (Evaluation Level) Identify and evaluate process parameters for plasma enchanced chemical vapor deposition. 9. (Comprehension Level) Identify and explain process parameters for low pressure chemical vapor deposition. |
Internal/External Standards Accreditation |
Nanotechnology Standards: ASTM URL: http://www.astm.org/Standards/nanotechnology-standards.html |